ISBN: 9780470065419
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ISBN: 9780470065419
The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in… mais…
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2007, ISBN: 9780470065419
The topic of thin films is an area of increasing importance inmaterials science, electrical engineering and applied solid statephysics; with both research and industrial applications inmi… mais…
2007
ISBN: 9780470065419
eBooks, eBook Download (PDF), 1. Auflage, [PU: John Wiley & Sons], John Wiley & Sons, 2007
2007, ISBN: 9780470065419
eBooks, eBook Download (PDF), Auflage, [PU: Wiley], [ED: 1], Wiley, 2007
2007, ISBN: 9780470065419
eBooks, eBook Download (PDF), 1. Auflage, [PU: Wiley], Wiley, 2007
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Dados detalhados do livro - Dielectric Films for Advanced Microelectronics
EAN (ISBN-13): 9780470065419
ISBN (ISBN-10): 0470065419
Ano de publicação: 2007
Editor/Editora: Wiley
508 Páginas
Língua: eng/Englisch
Livro na base de dados desde 2009-11-27T11:40:01+00:00 (Lisbon)
Página de detalhes modificada pela última vez em 2023-11-06T17:24:21+00:00 (Lisbon)
Número ISBN/EAN: 9780470065419
Número ISBN - Ortografia alternativa:
0-470-06541-9, 978-0-470-06541-9
Ortografia alternativa e termos de pesquisa relacionados:
Autor do livro: martin green, marti green, green karen, john paul, martin mae, baklanov
Título do livro: microelectronics
Dados da editora
Autor: Mikhail Baklanov
Título: Wiley Series in Materials for Electronic & Optoelectronic Applications; Dielectric Films for Advanced Microelectronics
Editora: Wiley; John Wiley & Sons
508 Páginas
Ano de publicação: 2007-04-04
Língua: Inglês
208,99 € (DE)
EA; E107; E-Book; Nonbooks, PBS / Chemie; Technische Anwendung von Oberflächenbeschichtungen und -filmen; Dielectrics & Electric Insulators; Dielektrika u. Isolatoren; Dielektrizität; Dünne Schichten, Oberflächen u. Grenzflächen; Electrical & Electronics Engineering; Elektrotechnik u. Elektronik; Materials Science; Materialwissenschaften; Mikroelektronik; Thin Films, Surfaces & Interfaces; Dielektrika u. Isolatoren; Dünne Schichten, Oberflächen u. Grenzflächen; BB
Series Preface. Preface. (Mikhail Baklanov, Martin Green and KarenMaex). 1. Low and Ultralow Dielectric Constant Films Preparedby Plasma-Enhanced Chemical Vapor Deposition. (A.Grill). 2. Spin-On Dielectric Materials. (GeraudDubois, Willi Volksen and Robert D. Miller). 3.Porosity of Low Dielectric Constant Materials. 3.1 Positron Annihilation Spectroscopy. (David W.Gidley, Hua-Gen Peng, and Richard Vallery). 3.2Structure Characterization of Nanoporous InterlevelDielectric Thin Films with X-ray and Neutron Radiation.(Christopher L. Soles, Hae-Jeong Lee, Bryan D. Vogt, Eric K.Lin, Wen-li Wu). 3.3 Ellipsometric Porosimetry. (M. R.Baklanov). 4.Mechanical and Transport Properties of Low-kDielectrics. (J.L. Plawsky, R. Achanta, W. Cho, O.Rodriguez, R. Saxena, and W.N. Gill). 5. Integration of low-k dielectric films in damasceneprocesses. (R.J.O.M. Hoofman, V.H. Nguyen,V. Arnal, M.Broekaart, L.G. Gosset,W.F.A. Besling, M. Fayolle and F.Iacopi). 6. ONO structures and oxynitrides in modern microelectronics.Material science, characterization and application.(Yakov Roizin and Vladimir Gritsenko). High Dielectric constant Materials. 7. Material Engineering of High-k GateDielectrics. (Akira Toriumi and Koji Kita). 8. PhysicalCharacterisation of ultra-thin high-k dielectric. (T.Conard, H. Bender and W. Vandervorst). 9. Electrical Characterization of Advanced GateDielectrics. (Robin Degraeve, Jurriaan Schmitz,Luigi Pantisano, Eddy Simoen, Michel Houssa, Ben Kaezer, andGuido Groeseneken). Medium dielectric constant materials. 10. Integration Issues of High-k Gate Dielectrics.(Yasuo Nara). Dielectric films for interconnects (packaging). 11. Anisotropic Conductive Film (ACF) for AdvancedMicroelectronic Interconnects. (Yi Li, C. P.Wong). Index.Outros livros adicionais, que poderiam ser muito similares com este livro:
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